News
Four granted invention patents disclosed, covering defect detection, ANN modeling and nanostructure metrology
Four granted invention patents cover simplified test structure design for defect detection, ANN-based optical property modeling database generation, measurement model construction for stacked nanosheet structures, and co-packaged optoelectronic device fabrication.
POLARIS-F100 spectroscopic ellipsometer and TITAN-M100 wafer micro-void metrology equipment launched
The spectroscopic ellipsometer and wafer micro-void metrology equipment are launched together, completing product coverage across films, critical dimensions and high aspect ratio micro-voids.
ARIA-S100 angle-resolved scattering OCD metrology equipment launched
The non-contact angle-resolved scattering metrology equipment is launched for films, gratings, nanowires and periodic microstructures, characterizing parameters below the resolution limit of conventional optical imaging.
Seemic establishes its Wuhan R&D center
The company has set up an R&D center in Wuhan, forming a dual-site R&D layout together with the Hangzhou headquarters.
Team awarded first prize of the 2020 National Science and Technology Progress Award
The team received first prize of the 2020 National Science and Technology Progress Award in advanced packaging, an achievement that underpins the advanced packaging metrology line.
Team awarded second prize of the 2016 National Technological Invention Award in packaging
The team received second prize of the 2016 National Technological Invention Award in packaging; engineering experience from packaging processes to packaging metrology runs through the product design.
Seemic (Hangzhou) Semiconductor Technology Co., Ltd. is officially founded
The company was officially founded on 16 June 2026 in Qiantang District, Hangzhou, with registered capital of RMB 2 million, focused on non-contact optical metrology equipment for semiconductors.